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XYALIS at SPIE Photomask conference 2017

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XYALIS will demonstrate his new Mask Data Preparation flow, including the automatic generation of SEMI P10 Order Forms. Visit us on booth #107 to know more about what we have achieved at the next SPIE Photomoask Technology Conference, September 12-14, 2017, in Monterey, California, USA. …

XYALIS at DAC conference 2017 : booth #2129

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After 2 years, the long migration started in 2015 has just ended and we are proud to announce that the results are beyond our best expectations. Shrinking geometries, new manufacturing paradigms, exploding file sizes… It’s time to rethink everything! XYALIS …

XYALIS at SPIE Photomask conference 2016

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XYALIS will demonstrate his integrated Mask Data Preparation flow, including the automatic generation of SEMI P10 Order Forms. Visit us on booth #114 to know more about what we have achieved at the next SPIE Photomoask Technology Conference, September 12-14, 2016, in Monterey, California, …

XYALIS at DAC Conference 2016 : booth #1918

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Shrinking geometries, new manufacturing paradigms, exploding file sizes… It’s time to rethink everything! XYALIS phases in a new generation of tools: from CMP fill to layout manipulation and mask data preparation, redesigned to address the challenges of today’s most advanced …

Automatic Mask Pattern Localization

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In collaboration with KLA-Tencor, XYALIS will present an article during the poster session of the SPIE Advanced Lithography conference in San Jose, California, USA, 21-25 february 2016. Automatic pattern localization across layout database and photolithography mask Abstract Advanced process photolithography masks …