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XYALIS announced today OASIS support for its family of layout finishing tools

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GRENOBLE, France – November 20th, 2006 With files size explosion at 65nm and 45nm nodes, OASIS becomes a must have alternative for mask prep and layout finishing tasks. OASIS can achieve a compression ratio in the range of 10X for …

XYALIS announced today GTstyle. The next generation tool for Dummies Filling at 65nm and below

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GRENOBLE, France – May 1st, 2006 XYALIS announced today that it has shipped GTstyle V1.0, its next generation tool for Dummies Filling at 65nm and below. Advanced processes, starting at 65nm and below, require very specific and complex design rules …