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XYALIS at SPIE Photomask conference 2017

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XYALIS will demonstrate his new Mask Data Preparation flow, including the automatic generation of SEMI P10 Order Forms. Visit us on booth #107 to know more about what we have achieved at the next SPIE Photomoask Technology Conference, September 12-14, 2017, in Monterey, California, USA. …

XYALIS at DAC conference 2017 : booth #2129

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After 2 years, the long migration started in 2015 has just ended and we are proud to announce that the results are beyond our best expectations. Shrinking geometries, new manufacturing paradigms, exploding file sizes… It’s time to rethink everything! XYALIS …