Author Archives: farid

Geometry-based signature for layout database comparison

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Grenoble – May 31st, 2018 – XYALIS unveils a new method to compare layouts databases using a geometry-based signature enabling a safe and fast traceability process. Read the article on TechDesignForum. As exchanges of layout descriptions between teams involved in modern …

XYALIS at DAC conference 2018 : booth #1610

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Leveraging years of leadership in layout finishing, XYALIS introduces a unique geometry-based signature enabling a safe and fast traceability process. It is tailored to handle the multiplicity of design styles and representation standards specific to electronic design while protecting intellectual property …

XYALIS at SPIE Photomask conference 2017

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XYALIS will demonstrate his new Mask Data Preparation flow, including the automatic generation of SEMI P10 Order Forms. Visit us on booth #107 to know more about what we have achieved at the next SPIE Photomoask Technology Conference, September 12-14, 2017, in Monterey, California, USA. …

XYALIS at DAC Conference 2016 : booth #1918

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Shrinking geometries, new manufacturing paradigms, exploding file sizes… It’s time to rethink everything! XYALIS phases in a new generation of tools: from CMP fill to layout manipulation and mask data preparation, redesigned to address the challenges of today’s most advanced …

Automatic Mask Pattern Localization

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In collaboration with KLA-Tencor, XYALIS will present an article during the poster session of the SPIE Advanced Lithography conference in San Jose, California, USA, 21-25 february 2016. Automatic pattern localization across layout database and photolithography mask Abstract Advanced process photolithography masks …