As the cost of design and mask sets have dramatically increased with the most advanced processes, it is critical for design teams and mask data preparation teams to include robust and repeatable layout manipulation tools in their flow in order to increase their productivity and remove risk of error.

During the DFM and Mask Data Preparation, designers may have to switch geometries and layers to incorporate last minute changes.

GOTlayer translates elements of a  GDSII or OASIS ® layout database from a layer to another for a safe and easy last minute adjustment:

  • Translation from one layer to another for process migration from one generation to the next or from one foundry to another
  • Remove all objects in a specific layer / datatype to clean databases from unexpected data, such as recognition layers and non-manufacturable layers
  • Flattens database
  • Optionally break polygons and paths in basic geometries (trapezoids)


GOTlayer, mainly used in multi-chip assemblies and chip information extractions creates a new version of the layout database in minutes.

GOTlayer is fully integrated in XYALIS layout manipulation suite and in XYALIS Mask Data Preparation solution. It handles standard layout: GDSII, OASIS ® and works directly on compressed of gzipped files.

GOTlayer can be run from a command line for automatic processing and easy inclusion in an existing flow.


  • Simplify process migration
  • Safe ECO changes
  • Fast revisions of chips and multi-chip assembly


  • Converts single or multiple layers
  • Removes useless layers
  • Flattens database
  • Use cblocks option for OASIS ® files