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XYALIS at DAC Conference 2016 : booth #1918

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Shrinking geometries, new manufacturing paradigms, exploding file sizes… It’s time to rethink everything! XYALIS phases in a new generation of tools: from CMP fill to layout manipulation and mask data preparation, redesigned to address the challenges of today’s most advanced …

Automatic Mask Pattern Localization

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In collaboration with KLA-Tencor, XYALIS will present an article during the poster session of the SPIE Advanced Lithography conference in San Jose, California, USA, 21-25 february 2016. Automatic pattern localization across layout database and photolithography mask Abstract Advanced process photolithography masks …

XYALIS supports Fahrenheit2451 project

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Grenoble, France – January 22nd, 2016 – XYALIS and ARNANO’s Fahrenheit 2451 Nanoforms combine art and technology and introduce a new way to preserve precious personal data. After the success of the Kickstarter Fahrenheit 2451 project, the first public sapphire …

DelfMEMS selects XYALIS’s MDP tools

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XYALIS and DelfMEMS announce that DelfMEMS selected XYALIS’s Mask Data preparation suite to address the challenges of the very sensitive mask design flow required by RF MEMS “This was an exciting challenge to completely automate the Mask Design operation for …

XYALIS at DAC Conference 2015 : booth #2606

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Multi-Project Wafers have never been that easy! With XYALIS GTmuch, the graphical shuttle editor, mask data preparation teams have been able to cut time to designing multi-chip assemblies. With XYALIS GTcross, the production aware placement engine, they have been able …