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Speed up time to manufacturing
XYALIS, an Electronic Design Automation (EDA) company, offers specialized tools in the area of Design for Manufacturing. XYALIS main tools includes CMP metal fill and MPW or shuttle layout optimization.

These tools brings advanced solution to the most important DFM issues found during the design and the mask preparation.

XYALIS tools also increase engineering productivity during tape-out and help reduce time to manufacturing.


With the emergence of SOC and increasing design complexity, layout finishing cope with new challenges. Current designs generate larger databases that become increasingly difficult to process. SOC and MCM are made up of blocks from different providers. This can yield to database consistency problems which need to be detected before tape-out.

Existing Multi-Purpose layout finishing tools, such as Design Rules Checkers are no longer able to address the issues of today's largest designs.

XYALIS focuses on two main flows of the layout finishing process:

Dummy/Metal filling to address Chemical Mechanical Polishing (CMP) issues

Mask data preparation


XYALIS brief description Download literature about our
Dummy/Metal Filling solutions

Dummy fill document

XYALIS brief description Download literature about our Mask
Data Preparation solutions

Mask Data prepation document
  SPIE BACCUS 2011
SPIE BACCUS 2011
XYALIS will be present at the SPIE Photomask Technology/Baccus Conference,
September 20th-21th 2011 in Monterey, CA, USA
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  XYALIS and SIINT strategic cooperation

XYALIS and SII NanoTechnology announce strategic cooperation agreement to broaden availability of their Photomask Data Preparation solutions.
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  Mask Data Preparation

XYALIS to Unveil Fully Integrated Mask Data Preparation Suite.
XYALIS launches GTmask suite with support of Multi-Layer Reticles and Multi-Project Wafers.
Read more...

  XYALIS office in San Jose, USA
Xyalis marks North American Operations expansion with official opening of an office in San Jose, California.
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  Hybrid Filling Tool  New Release
In addition to all exclusive functionnalities such as roughness management or parasitics reduction, GTstyle v2.2 provides new great features.
See press release...
  Building CMP Models
XYALIS Announce an Advanced Methodology for Building CMP Models.
See press release...
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