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Dummy Filling

  • Hybrid dummy filling
  • High speed parallel processing
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IC Layout

  • Powerful toolbox for GDSII/OASIS/Mebes operations
  • Available with user friendly GUI
    and as command line
  • Direct read and write gzip files
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Mask Data Preparation

  • Generation of Multi Project Wafers (MPWs) or shuttles
  • Generation of complex reticles
  • Intuitive mask set creation
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GOTcheck 

New Generation Layout Integrity Checker :

  • Largest layouts support
  • OASIS mask native support
  • New non-manufacturability tests
  • Ascii and Excel© report
  • Twice Faster

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New MDP Product


News & Press

XYALIS at DAC Conference 2016 : booth #1918


- Shrinking geometries, new manufacturing paradigms, exploding file sizes… It’s time to rethink everything! XYALIS phases in a new generation of tools: from CMP fill to layout manipulation and mask data preparation, redesigned to address the... [Continue Reading]

Automatic Mask Pattern Localization


- In collaboration with KLA-Tencor, XYALIS will present an article during the poster session of the SPIE Advanced Lithography conference in San Jose, California, USA, 21-25 february 2016. Automatic pattern localization across layout database and photolithography mask... [Continue Reading]

XYALIS supports Fahrenheit2451 project


- XYALIS and ARNANO’s Fahrenheit 2451 Nanoforms combine art and technology and introduce a new way to preserve precious personal data. After the success of the Kickstarter Fahrenheit 2451 project, the first public sapphire medallions archives... [Continue Reading]