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As the cost of a complete mask set has dramatically increased and now represents a significant part of the overall project cost. Thus, it is critical for design teams, mask data preparation teams, and mask shops to implement a robust and repeatable Mask Data Preparation flow. Doing so, it increases the productivity of mask set creation and removes any risk of error.

XYALIS offers a suite of tightly integrated state-of-the-art Mask Data Preparation modules. They automate the repetitive and time consuming tasks between design and fracturing:

  • Generation of Multi Project Wafers (MPW) or shuttles with GOTmuch. It’s an automated placement tool dedicated to maximizing silicon usage and minimizing saw lines when assembling heterogeneous chips,
  • Generation of complex reticles with GOTframe. It’s an automated tool for inserting manufacturing items between chips and inside scribe lines, according to reusable process rules,
  • Intuitive mask set creation with GOTmask, supporting Multi-Layer Reticles (MLR), optimized 1X flow, and wafer map optimization.

 

Built around a powerful dedicated graphical editor and a shared data format, XYALIS MDP solution handles standard layout and job deck formats: GDSII, OASIS ®, MEBES. Each module can be run through the common graphical user interface or on the command line for automatic processing and easy inclusion in an existing flow.

Mask Data Preparation Flow



GOTframe

Frame assembly editor

GOTframe assembly editor

  • Reusable frame description file
  • Automated item placement
  • Field ...
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GOTcross

Multi Project Wafer Placement

GOTcross: Multi Project Wafer Placement

  • Handles production requirements
  • Handles manufacturing requirements
  • Customized ...
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GOTmask

Mask Set Editor

  • Automatic generation of titles and barcodes
  • Includes a library ...
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GOTmuch

Multi Project Wafer editor

GOTmuch - Multi project wafer Assembly Tools

  • Full flow automation and checks
  • Fast complex chip assembly
  • Sawing-line ...
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GOTfiller

  • Insert dummy tile or full layer at reticle level
  • High Performance ...
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