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After 2 years, the long migration started in 2015 has just ended and we are proud to announce that the results are beyond our best expectations. Shrinking geometries, new manufacturing paradigms, exploding file sizes… It’s time to rethink everything! XYALIS …
XYALIS will demonstrate his integrated Mask Data Preparation flow, including the automatic generation of SEMI P10 Order Forms. Visit us on booth #114 to know more about what we have achieved at the next SPIE Photomoask Technology Conference, September 12-14, 2016, in Monterey, California, …
Paris, France – Xyalis has announced a major upgrade to GTmuch, the company’s graphical tool dedicated to floorplanning and assembly of multiple GDSII databases for Multi-Chip Modules (MCM) and Multi-Project Chips or Wafers (MPC or MPW). At the same time Xyalis has updated its complete suite of GDSII utilities.
Grenoble, France – XYALIS announced today that STMicrolectronics, after several month of validation, has qualified GTsmooth post CMP oxide thickness estimation capabilities
November 11th, 2002 -
News
Lyon, France – XYALIS, the leading provider of layout finishing tools, today announces GTsmooth, the first hybrid metal-fill tool, which combines the benefits of rules- and model-based methods to increase the manufacturing yield of chips and wafers, to limit the parasitic effects due to dummy insertion, while keeping lowest processing time and database size.
XYALIS History
Since 1995, a Chemical-Mechanical Polishing (CMP) step has been adopted in the semiconductor manufacturing process to flatten wafer surface between each metal layer. Metal density variations can badly impact this CMP process, thus the need for designers to insert “dummy tiles” into there design to help flatten the surface for each metal layer.
Since the beginning of the company, XYALIS has provided metal-fill tools to address this issue. The first member of this family has been GTtiler. This tool has been in production use at major semiconductor site around the world for many years and has successfully completed a very high number of design tape-outs. It still provides the highest processing speed and the lowest database expansion factor.
In 2002 XYALIS introduced GTsmooth, a model-based CMP process estimator and dummy tiles insertion tool. The approach of inserting “dummy” metal tiles in all empty areas was not satisfactory because it introduced too many parasitics. Traditional methods were not successful in solving this problem and it was necessary to introduce a model based algorithm to get the best results and to minimize the number of inserted tiles while achieving the highest yield.
In 2006 XYALIS introduced GTstyle, a new tool for dummies insertion targeting 65nm processes and below. This new tool combines the advantages of the “model-based” approach while maintaining a compatibility with the design rules checks.
Today in 2012, this tool is used in production for 28nm processes.
In 2010 XYALIS introduced GTcross, the first Production Yield oriented placement tool for MPWs.
In 2012 XYALIS introduces GTmodus, the first commercial tool for Mask Ordering management, based onto a relational Database and a Web Application, and using the industrial SEMI P10 format for data exchange between Semiconductor players (Design centers, FABs) and Maskshops.
