Author Archives: farid
January 31st, 2011 -
Press
GRENOBLE, France, January 31st, 2011 Chiba, Japan, January 31th, 2011 XYALIS, a leader in Mask Data Preparation software, and SII NanoTechnology, a leader in Photomask Verification software, announced today that they have signed a strategic cooperation agreement to broaden availability …
GRENOBLE, France, May 26th, 2010 As technology progresses the cost of a complete mask set has been increasing. It is not rare to see a complete mask set reach millions of dollars with the newest technology nodes, a significant part …
GRENOBLE, France, March 21st, 2008 Xyalis marks North American Operations expansion with official opening of an office in San Jose, California, announces Eric Beisser – CEO of Xyalis. Xyalis, the leader in layout finishing solutions, today officially announced the opening …
August 21st, 2007 -
Press
GRENOBLE, France, August 21st, 2007 In addition to all exclusive functionnalities such as roughness management or parasitics reduction, GTstyle v2.2 provides new great features: Full Oasis compatibility Management of multiple size dummy cells Automatic interconnection of dummy …
GRENOBLE, France – June 1st, 2007 XYALIS will be able to provide high accuracy thickness measurements on wafers. XYALIS announce today that thanks to “non destructive” nanometric measurement equipment’s, XYALIS is able to build Chemo Mechanical Planarization (CMP) models. These …
XYALIS History
Since 1995, a Chemical-Mechanical Polishing (CMP) step has been adopted in the semiconductor manufacturing process to flatten wafer surface between each metal layer. Metal density variations can badly impact this CMP process, thus the need for designers to insert “dummy tiles” into there design to help flatten the surface for each metal layer.
Since the beginning of the company, XYALIS has provided metal-fill tools to address this issue. The first member of this family has been GTtiler. This tool has been in production use at major semiconductor site around the world for many years and has successfully completed a very high number of design tape-outs. It still provides the highest processing speed and the lowest database expansion factor.
In 2002 XYALIS introduced GTsmooth, a model-based CMP process estimator and dummy tiles insertion tool. The approach of inserting “dummy” metal tiles in all empty areas was not satisfactory because it introduced too many parasitics. Traditional methods were not successful in solving this problem and it was necessary to introduce a model based algorithm to get the best results and to minimize the number of inserted tiles while achieving the highest yield.
In 2006 XYALIS introduced GTstyle, a new tool for dummies insertion targeting 65nm processes and below. This new tool combines the advantages of the “model-based” approach while maintaining a compatibility with the design rules checks.
Today in 2012, this tool is used in production for 28nm processes.
In 2010 XYALIS introduced GTcross, the first Production Yield oriented placement tool for MPWs.
In 2012 XYALIS introduces GTmodus, the first commercial tool for Mask Ordering management, based onto a relational Database and a Web Application, and using the industrial SEMI P10 format for data exchange between Semiconductor players (Design centers, FABs) and Maskshops.
