Author Archives: farid
Shrinking geometries, new manufacturing paradigms, exploding file sizes… It’s time to rethink everything! XYALIS phases in a new generation of tools: from CMP fill to layout manipulation and mask data preparation, redesigned to address the challenges of today’s most advanced …
January 27th, 2016 -
News
In collaboration with KLA-Tencor, XYALIS will present an article during the poster session of the SPIE Advanced Lithography conference in San Jose, California, USA, 21-25 february 2016. Automatic pattern localization across layout database and photolithography mask Abstract Advanced process photolithography masks …
January 22nd, 2016 -
News
Grenoble, France – January 22nd, 2016 – XYALIS and ARNANO’s Fahrenheit 2451 Nanoforms combine art and technology and introduce a new way to preserve precious personal data. After the success of the Kickstarter Fahrenheit 2451 project, the first public sapphire …
Multi-Project Wafers have never been that easy! With XYALIS GTmuch, the graphical shuttle editor, mask data preparation teams have been able to cut time to designing multi-chip assemblies. With XYALIS GTcross, the production aware placement engine, they have been able …
XYALIS will unveils GTwatermark which secures your flow by warranting the integrity of your reference layout files, at the DAC Conference, June 2nd-4th 2014 in San Francisco, CA, USA – Booth #403. Have you ever wondered if you were using the right …
XYALIS History
Since 1995, a Chemical-Mechanical Polishing (CMP) step has been adopted in the semiconductor manufacturing process to flatten wafer surface between each metal layer. Metal density variations can badly impact this CMP process, thus the need for designers to insert “dummy tiles” into there design to help flatten the surface for each metal layer.
Since the beginning of the company, XYALIS has provided metal-fill tools to address this issue. The first member of this family has been GTtiler. This tool has been in production use at major semiconductor site around the world for many years and has successfully completed a very high number of design tape-outs. It still provides the highest processing speed and the lowest database expansion factor.
In 2002 XYALIS introduced GTsmooth, a model-based CMP process estimator and dummy tiles insertion tool. The approach of inserting “dummy” metal tiles in all empty areas was not satisfactory because it introduced too many parasitics. Traditional methods were not successful in solving this problem and it was necessary to introduce a model based algorithm to get the best results and to minimize the number of inserted tiles while achieving the highest yield.
In 2006 XYALIS introduced GTstyle, a new tool for dummies insertion targeting 65nm processes and below. This new tool combines the advantages of the “model-based” approach while maintaining a compatibility with the design rules checks.
Today in 2012, this tool is used in production for 28nm processes.
In 2010 XYALIS introduced GTcross, the first Production Yield oriented placement tool for MPWs.
In 2012 XYALIS introduces GTmodus, the first commercial tool for Mask Ordering management, based onto a relational Database and a Web Application, and using the industrial SEMI P10 format for data exchange between Semiconductor players (Design centers, FABs) and Maskshops.
