Mask Data Preparation
- Generation of Multi Project Wafers (MPWs) or shuttles
- Generation of complex reticles
- Intuitive mask set creation
Dummy Filling
- 3rd Generation of dummy filling
- High speed parallel processing
- Available at chip level, reticle level or wafer level
Toolbox
- Powerful toolbox for GDSII, OASIS ®, Mebes operations
- High reliability for last minute updates
- Secure your tapeout
XYALIS at SPIE Photomask conference 2025
September 17th, 2025
Time to update your Mask Data Preparation flow?
This year at the BACUS conference in Monterey, XYALIS introduces an interactive graphical option to ease the adoption of automated frame generation by... [Continue Reading]
News & Press
Beyond Tapeout: Opening the Dark Side of Mask Data Preparation
July 29th, 2025 - News The transition from chip design to manufacturing is often seen as seamless, but mask data preparation (MDP) remains complex and under-automated. This paper explores MDP challenges and how XYALIS solutions close automation gaps to improve... [Continue Reading]
Leveraging the Advantages of OASIS Files
May 6th, 2025 - News The OASIS® format (Open Artwork System Interchange Standard) was introduced to address the growing complexity of chip design layouts and to overcome the limitations of the aging GDSII format. While it offers immense potential for more... [Continue Reading]
XYALIS at SPIE Photomask conference 2024
October 1st, 2024 - News Time to update your Mask Data Preparation flow? XYALIS offers cutting-edge MDP solutions tailored to your workflow. Work with our customer oriented team to boost your MDP productivity through customized, production-proven engines that seamlessly integrate... [Continue Reading]
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To build reliable flows involving data exchange with other tools and equipments, XYALIS is fully compliant with SEMI standards. |
