XYALIS at SPIE Photomask conference 2025
Time to update your Mask Data Preparation flow?
This year at the BACUS conference in Monterey, XYALIS introduces an interactive graphical option to ease the adoption of automated frame generation by R&D teams. This complements XYALIS solution which automates the different steps of Mask Data Preparation – Multi Chip Wafer placement, Frame Generation, Mask Layout, Wafer Map creation and Dummy Fill Insertion – for the most advanced technologies – Multi-Layer Reticles, Stitching, and 3DIC masks -.
Visit XYALIS at booth #210 to elevate your mask design efficiency.
See us at SPIE Photomask Conference Technology + EUVL exhibition, Monterey Conference Center, 1 Portola Plaza, Monterey, CA 93940, USA.
- Tuesday, September 24th, 2025, from 10:00 am to 4:00 pm
- Wednesday, September 25th, from 9:30 am to 4:00 pm
