January 31st, 2011  			  -
			  
Press			  
			
				
				GRENOBLE, France, January 31st, 2011 Chiba, Japan, January 31th, 2011 XYALIS, a leader in Mask Data Preparation software, and SII NanoTechnology, a leader in Photomask Verification software, announced today that they have signed a strategic cooperation agreement to broaden availability …