Resources, white papers, articles

Collaborating with MOSIS by using GOTmuch and GOTfiller, XYALIS has set up a new methodology to MPW yield and control CPI. The result has been presented in a paper during the SPIE Advanced Lithography online conference, California, USA, 22-26 february …

Philippe Morey, Frederic Brault, Eric Beisser, Farid BenzakourXYALIS – Grenoble – FranceConference: SPIE Photomask Technology + EUV Lithography, 2019, Monterey, California, United States ABSTRACT This paper addresses large dies stitching challenges. Stitching is a way to combine several shots ”stitched …

Configurations and customization files This page contains customization files to improve user interface when editing files for GOTmuch, GOTframe or GOTmask. We provide configuration files for the following editors : Emacs Nedit Vim Emacs Here is the configuration file for …

By Dr Philippe Morey-Chaisemartin & Frederic Brault XYALIS, France. Published in TechDesign Forum – May 31st 2018 As the exchange of layout descriptions between teams involved in modern integrated circuit (IC) development and production increase in terms of rate, value …

Philippe Morey(1), Frederic Brault(1), Eric Beisser(1), Oliver Ache(2), Klaus-Dieter Röth(2)1: XYALIS – France2: KLA-Tencor MIE GmbH, GermanyConference: SPIE© Advanced Lithography, 2016, San Jose, California, United States ABSTRACT Advanced process photolithography masks require more and more controls for registration versus design and …