News & Press subtitle

In collaboration with KLA-Tencor, XYALIS will present an article during the poster session of the SPIE Advanced Lithography conference in San Jose, California, USA, 21-25 february 2016. Automatic pattern localization across layout database and photolithography mask Abstract Advanced process photolithography masks …

Grenoble, France – January 22nd, 2016 – XYALIS and ARNANO’s Fahrenheit 2451 Nanoforms combine art and technology and introduce a new way to preserve precious personal data. After the success of the Kickstarter Fahrenheit 2451 project, the first public sapphire …

XYALIS and DelfMEMS announce that DelfMEMS selected XYALIS’s Mask Data preparation suite to address the challenges of the very sensitive mask design flow required by RF MEMS “This was an exciting challenge to completely automate the Mask Design operation for …

Multi-Project Wafers have never been that easy! With XYALIS GTmuch, the graphical shuttle editor, mask data preparation teams have been able to cut time to designing multi-chip assemblies. With XYALIS GTcross, the production aware placement engine, they have been able …

XYALIS will unveils GTwatermark which secures your flow by warranting the integrity of your reference layout files, at the DAC Conference, June 2nd-4th 2014 in San Francisco, CA, USA – Booth #403. Have you ever wondered if you were using the right …