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Geometric based signature – US patent issuance

Grenoble – June 29th, 2021 XYALIS,  is proud to announce that the United States Patent and Trademark Office (USPTO) has issued U.S. Patent No. 10,956,368 (March 23, 2021 – application number 16/961,375, equivalent to European patent #WO2019141942). In this patent, …

May’21: New Release

Grenoble – May 12th, 2021 – Today XYALIS unveils a new release bringing powerful improvements to increase OASIS® reading/writing operations performance.  Compression and decompression functions have been optimized so that reading or writing an OASIS® file with cblocks, which is the …

Reducing stress effects on multi-project-wafer reticles

Collaborating with MOSIS by using GOTmuch and GOTfiller, XYALIS has set up a new methodology to MPW yield and control CPI. The result has been presented in a paper during the SPIE Advanced Lithography online conference, California, USA, 22-26 february …

Spie 2020 – Baccus : Maskset automatic flow

This year SPIE Advanced Lithography conference was online. Here is XYALIS presentation that shows a complete maskset automatic flow management with its mask order form in SEMI P10 format. In this presentation, we see how it is easy to set …

Oct’20: New Release

Grenoble – October 20th, 2020 – Today XYALIS unveils a new release bringing new powerful features in mask data preparation and dummy filling tools. It includes a python interpreter for maskset manager and dummy fill tool. Also to increase OASIS reading/writing …



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